Optical emission patterns and microwave field distributions in a cylindrical microwave plasma source

Citation
F. Fang et al., Optical emission patterns and microwave field distributions in a cylindrical microwave plasma source, THIN SOL FI, 390(1-2), 2001, pp. 197-201
Citations number
16
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
0040-6090 → ACNP
Volume
390
Issue
1-2
Year of publication
2001
Pages
197 - 201
Database
ISI
SICI code
0040-6090(20010630)390:1-2<197:OEPAMF>2.0.ZU;2-O
Abstract
A cylindrical high density(similar to 10(12) cm(-3)) large volume (32 cm in diameter and 50 cm in length) homogeneous argon plasma has been produced b y a microwave with a frequency of 2.45 GHz and a power of 900 W without a m agnetic held. The plasma source is based on a ring shaped rectangular waveg uide with eight equally spaced slots in its inside wall. Several optical em ission patterns are observed on different conditions and the microwave fiel d is measured by a movable antenna, which showed a clear relationship betwe en the optical emission patterns and the electron field distributions. A mo de transition, from a TE8j mode to a TE16j mode, occurs when the gas pressu re increases from 660 to 1000 Pa. And there is an optical emission pattern when the microwave power decreases from 900 to 300 W. Al these phenomena ar e described in detail and analyzed according to the interactional theory of electrons in plasma with microwave. (C) 2001 Elsevier Science B.V. All rig hts reserved.