Laser-assisted selective deposition of nickel patterns on porous silicon substrates

Citation
K. Kordas et al., Laser-assisted selective deposition of nickel patterns on porous silicon substrates, APPL SURF S, 178(1-4), 2001, pp. 93-97
Citations number
21
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
0169-4332 → ACNP
Volume
178
Issue
1-4
Year of publication
2001
Pages
93 - 97
Database
ISI
SICI code
0169-4332(20010702)178:1-4<93:LSDONP>2.0.ZU;2-8
Abstract
In this paper, a simple method is presented for the fabrication of nickel ( Ni) patterns on porous silicon (PS) substrates using a focused and scanned Ar+-laser beam. A commercially available electroless plating bath was opera ted as a precursor during the laser direct writing process. As a result, th in (t = 40-250 nm), narrow (w = 2-3 mum), uniform and conductive Ni deposit s were formed on the surface of the PS. The deposits were characterized by profilometry, FESEM (equipped with EDX), FIB and resistance measurements. ( C) 2001 Elsevier Science B,V. All rights reserved.