In this paper, a simple method is presented for the fabrication of nickel (
Ni) patterns on porous silicon (PS) substrates using a focused and scanned
Ar+-laser beam. A commercially available electroless plating bath was opera
ted as a precursor during the laser direct writing process. As a result, th
in (t = 40-250 nm), narrow (w = 2-3 mum), uniform and conductive Ni deposit
s were formed on the surface of the PS. The deposits were characterized by
profilometry, FESEM (equipped with EDX), FIB and resistance measurements. (
C) 2001 Elsevier Science B,V. All rights reserved.