Electrochemical and structural properties of radio frequency sputtered cobalt oxide electrodes for thin-film supercapacitors

Citation
Hk. Kim et al., Electrochemical and structural properties of radio frequency sputtered cobalt oxide electrodes for thin-film supercapacitors, J POWER SOU, 102(1-2), 2001, pp. 167-171
Citations number
21
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physical Chemistry/Chemical Physics","Environmental Engineering & Energy
Journal title
JOURNAL OF POWER SOURCES
ISSN journal
0378-7753 → ACNP
Volume
102
Issue
1-2
Year of publication
2001
Pages
167 - 171
Database
ISI
SICI code
0378-7753(200112)102:1-2<167:EASPOR>2.0.ZU;2-X
Abstract
The electrochemical and structural properties of cobalt oxide films which a re deposited at different sputtering gas-ratios Of O-2/(Ar + O-2) are inves tigated. In order to examine the electrochemical properties of the as-depos ited films, all solid-state thin-film. supercapacitors (TFSCs) are fabricat ed. There Consist Of Co3O4 electrodes and an amorphous LiPON thin-film elec trolyte. It is shown that the capacitance behaviour of the Co3O4/LiPON/Co3O 4 TFSCs is similar to bulk-type supercapacitor behaviour. It is further sho wn that the electrochemical behaviour of the TFSCs is dependent on the sput tering gas-ratios. The gas-ratio dependence of the capacitance of the oxide electrode films is discussed based on X-ray diffraction (XRD) and electric al results for the Co3O4 films. (C) 2001 Published by Elsevier Science B.V.