Fundamental aspects of organometallic vapor phase epitaxy

Citation
Gb. Stringfellow, Fundamental aspects of organometallic vapor phase epitaxy, MAT SCI E B, 87(2), 2001, pp. 97-116
Citations number
129
Language
INGLESE
art.tipo
Review
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
0921-5107 → ACNP
Volume
87
Issue
2
Year of publication
2001
Pages
97 - 116
Database
ISI
SICI code
0921-5107(20011115)87:2<97:FAOOVP>2.0.ZU;2-G
Abstract
This review discusses new developments in our attempts to understand the fu ndamental aspects of organometallic vapor phase epitaxy (OMVPE), a process now widely used in the manufacture of III/V materials for photonic and elec tronic applications. It includes discussions of thermodynamic, hydrodynamic , and kinetic aspects of the growth process, with an emphasis on recent dev elopments in the area of surface processes, The bonding at the surface duri ng OMVPE growth is found to be determined mainly by thermodynamic factors. However, features such as steps and kinks are controlled by kinetic factors . The surface bonding, including that determined by the step structure, is just being discovered as being a key determining factor in the fundamental growth processes, including adsorption/desorption, surface pyrolysis reacti ons, and surface diffusion. Thus, surface processes determine many aspects of the growth process and, in many cases, the properties of the resulting e pitaxial layers. (C) 2001 Elsevier Science B.V. All rights reserved.