Plasma-enhanced chemical vapor deposition of nitrides on fluidized particles

Citation
I. Sanchez et al., Plasma-enhanced chemical vapor deposition of nitrides on fluidized particles, POWD TECH, 120(1-2), 2001, pp. 134-140
Citations number
25
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Chemical Engineering
Journal title
POWDER TECHNOLOGY
ISSN journal
0032-5910 → ACNP
Volume
120
Issue
1-2
Year of publication
2001
Pages
134 - 140
Database
ISI
SICI code
0032-5910(20011008)120:1-2<134:PCVDON>2.0.ZU;2-J
Abstract
A new plasma jet fluidized bed reactor working at atmospheric pressure is p resented. The plasma arc is created inside the bed of particles in order to improve the reactivity between excited gaseous species and the particles t o be coated. Metal chlorides, nitrogen and hydrogen were used as precursors of deposited layers. TiN, Si3N4 and SiOx, coatings were deposited on silic a and corundum particles by this plasma-assisted CVD process. Optical emiss ion spectroscopy and electron microanalysis characterized the plasma and th e layer composition, respectively.