Microstructures and electrochemical properties of Pt-doped amorphous V2O5 cathode films for thin film microbatteries

Citation
Hk. Kim et al., Microstructures and electrochemical properties of Pt-doped amorphous V2O5 cathode films for thin film microbatteries, J VAC SCI A, 19(5), 2001, pp. 2549-2553
Citations number
14
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
0734-2101 → ACNP
Volume
19
Issue
5
Year of publication
2001
Pages
2549 - 2553
Database
ISI
SICI code
0734-2101(200109/10)19:5<2549:MAEPOP>2.0.ZU;2-3
Abstract
We have investigated the effects of Pt doping on the structural and electro chemical properties of amorphous (a) V2O5 films grown by radio frequency ma gnetron sputtering. It is shown that the cycling performance of the alpha - V2O5 films is dependent upon the Pt content. Glancing angle x-ray diffracti on and transmission electron microscopy examination shows that the undoped film is amorphous with some short-range order. However, doping of the films at a rf power of 10 W leads to a complete alpha -V2O5 film which shows the best cycling behavior among the samples. It is shown that the short-range ordered structure reappears when the films are doped by cosputtering at rf powers of 30 and 50 W. It is further shown that doping at a rf power of 50 W results in the formation of amorphous and nanocrystalline PtO5 phases emb edded in the alpha -V2O5 matrix. (C) 2001 American Vacuum Society.