Electron-beam lithography patterning of magnetic nickel films

Citation
A. Gerardino et al., Electron-beam lithography patterning of magnetic nickel films, MICROEL ENG, 57-8, 2001, pp. 931-937
Citations number
9
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
0167-9317 → ACNP
Volume
57-8
Year of publication
2001
Pages
931 - 937
Database
ISI
SICI code
0167-9317(200109)57-8:<931:ELPOMN>2.0.ZU;2-K
Abstract
Electron beam (e-beam) lithography has been used to fabricate arrays of rec tangular and triangular shaped nickel dots. Dot dimensions range from 250 n m to 1 mum with separations of sub 100, 100 and 250 nm. The array dimension s are about I mm(2). X-ray masks to perform the dot patterning by X-ray lit hography have been fabricated too. The whole lithographic process is descri bed together with preliminary results concerning the magnetic characterisat ion of the patterned structures. (C) 2001 Elsevier Science BY All rights re served.