In this paper, we describe the progress towards the fabrication of a tip on
top of a glass fiber. This paper focuses exclusively on the patterning whi
ch is defined on top of the flat end of the fiber, covered by a thin layer
of chromium film that has been previously deposited. A special electron res
ist is used to transfer the circular pattern on the fiber. The resist consi
sts of octavynilsilsexquioxane which is evaporated on top of the fiber by s
ublimation. The use of a dry resist enables us to deposit a uniform layer o
n a very small area which is a very difficult task to obtain with the use o
f wet resists, which require spinning techniques, that should also be very
difficult to use in the specific case of the end of an optical fiber. After
development, the pattern is transferred to the chromium film underneath by
wet etching. This procedure has been optimized in order to preserve the pa
ttern resolution obtained by means of electron beam lithography. The chromi
um film is the mask which will be used to perform the etching of the fiber.
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