Progress toward the fabrication of scanning near field optical probe: pattern definition by e-beam lithography

Citation
V. Foglietti et al., Progress toward the fabrication of scanning near field optical probe: pattern definition by e-beam lithography, MICROEL ENG, 57-8, 2001, pp. 807-811
Citations number
7
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
0167-9317 → ACNP
Volume
57-8
Year of publication
2001
Pages
807 - 811
Database
ISI
SICI code
0167-9317(200109)57-8:<807:PTTFOS>2.0.ZU;2-W
Abstract
In this paper, we describe the progress towards the fabrication of a tip on top of a glass fiber. This paper focuses exclusively on the patterning whi ch is defined on top of the flat end of the fiber, covered by a thin layer of chromium film that has been previously deposited. A special electron res ist is used to transfer the circular pattern on the fiber. The resist consi sts of octavynilsilsexquioxane which is evaporated on top of the fiber by s ublimation. The use of a dry resist enables us to deposit a uniform layer o n a very small area which is a very difficult task to obtain with the use o f wet resists, which require spinning techniques, that should also be very difficult to use in the specific case of the end of an optical fiber. After development, the pattern is transferred to the chromium film underneath by wet etching. This procedure has been optimized in order to preserve the pa ttern resolution obtained by means of electron beam lithography. The chromi um film is the mask which will be used to perform the etching of the fiber. (C) 2001 Elsevier Science B.V. All rights reserved.