Preparation of CNx/TiNy multilayers by ion beam sputtering

Citation
Dl. Yu et al., Preparation of CNx/TiNy multilayers by ion beam sputtering, J CRYST GR, 233(1-2), 2001, pp. 303-311
Citations number
27
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
0022-0248 → ACNP
Volume
233
Issue
1-2
Year of publication
2001
Pages
303 - 311
Database
ISI
SICI code
0022-0248(200111)233:1-2<303:POCMBI>2.0.ZU;2-D
Abstract
CNx/TiNy multilayers have been prepared by ion beam sputtering and analyzed by X-ray diffraction, transmission electron microscopy, selected area elec tron diffraction, energy dispersive X-ray and X-ray photoemission spectrosc opy. The structure analyses shows that the films may contain several differ ent kinds of C-N crystals embedded in the amorphous matrix. These crystals have hexagonal and cubic crystalline structures. The TiNx layer in multilay ers is primarily amorphous and contains only a few dispersed Ti2N crystals. The thickness of CN, and TiNy layers in the CNx/TiNy multilayers is about 20 and 30 nm, respectively. The atomic ratios of [N]/([C] + [N] + [Til) in the multilayers vary from 20 to 41 at%. The bonding ratios of C - N/C = N o f the CN, layer in multilayers reach 0.447 or 0.585 as calculated from the C1s and N1s X-ray photoemission spectra, respectively. (C) 2001 Published b y Elsevier Science B.V.