Macropore formation in anodized p-type silicon

Citation
H. Harada et al., Macropore formation in anodized p-type silicon, JPN J A P 1, 40(8), 2001, pp. 4862-4863
Citations number
4
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
8
Year of publication
2001
Pages
4862 - 4863
Database
ISI
SICI code
0021-4922(200108)40:8<4862:MFIAPS>2.0.ZU;2-6
Abstract
The morphology of anodized p-type Si with the native oxide formed between t he back surface of Si and the back metal was studied. Anodization of p-type Si having a 4.2 Angstrom native oxide laver resulted in the formation of a pproximately rectangular parallelepiped macropores with pore size of 1-3 mu m followed by needlelike structures with diameter of 1.7 mum and finally th e mirror surface. with an increase of the current density.