Formation of vertically aligned carbon nanotubes by dual-RF-plasma chemical vapor deposition

Citation
T. Hirao et al., Formation of vertically aligned carbon nanotubes by dual-RF-plasma chemical vapor deposition, JPN J A P 2, 40(6B), 2001, pp. L631-L634
Citations number
7
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
6B
Year of publication
2001
Pages
L631 - L634
Database
ISI
SICI code
0021-4922(20010615)40:6B<L631:FOVACN>2.0.ZU;2-1
Abstract
The dual-RF-plasma chemical vapor deposition (dual-RF CVD) technique was ex amined for the formation of large areas of vertically aligned multiwalled c arbon nanotubes (MWNTs). Two RF powers, Pdischarge (P-dis) and Psubstrate ( P-sub), were used for the dissociation of methane gas and control of the en ergy of positive ions impinging on the substrates, respectively. The P-sub is necessary for the formation of MWNTs, without which a foil-like carbon n anostructured film was deposited. The positive ion bombardment works to sup press the deposition of amorphous carbon films and foil-like carbon nanostr uctures. Formation of MWNTs was observed within an area of 25 cm(2) under t he experimental setup, A threshold temperature between 500 to 540 degreesC was defined for the formation of vertically aligned MWNTs.