Nanofabrication induced by near-field exposure from a nanosecond laser pulse

Citation
O. Watanabe et al., Nanofabrication induced by near-field exposure from a nanosecond laser pulse, APPL PHYS L, 79(9), 2001, pp. 1366-1368
Citations number
21
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
0003-6951 → ACNP
Volume
79
Issue
9
Year of publication
2001
Pages
1366 - 1368
Database
ISI
SICI code
0003-6951(20010827)79:9<1366:NIBNEF>2.0.ZU;2-H
Abstract
We demonstrate a photoinduced nanofabrication method, applicable to dimensi ons beyond the diffraction limit, by employing a nanosecond laser pulse wit h a high peak power. The second-harmonic wave of a Nd: yttrium-aluminum-gar net (YAG) laser with a 5 ns pulse width was irradiated onto the sample, whi ch consisted of a hexagonal arrayed monolayer of nanoparticles on an azopol ymer film. Topographical changes in the surface after irradiation were obse rved by atomic force microscopy. A transcription of the arrayed structure i n the form of a dent structure was attained. In the case of 100 nm nanopart icles, the resolution of the transcription was beyond the diffraction limit . The dent depth and diameter were changed depending on the diameter of the nanoparticles and the irradiation power used. A depth analysis indicates a threshold for the ablation process. (C) 2001 American Institute of Physics .