Effects of boron-interstitial silicon clusters on interstitial supersaturation during postimplantation annealing

Citation
S. Solmi et al., Effects of boron-interstitial silicon clusters on interstitial supersaturation during postimplantation annealing, APPL PHYS L, 79(8), 2001, pp. 1103-1105
Citations number
16
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
0003-6951 → ACNP
Volume
79
Issue
8
Year of publication
2001
Pages
1103 - 1105
Database
ISI
SICI code
0003-6951(20010820)79:8<1103:EOBSCO>2.0.ZU;2-1
Abstract
Boron marker-layer structures have been used to investigate the effects of B doping on the evolution of the implantation damage and of the associated transient enhanced diffusion. The samples were damaged by Si implants at di fferent doses in the range 2x10(13)-1x10(14) cm(-2) and annealed at 740 deg reesC for times between 2 s and 4 h. The values of interstitial supersatura tion, from the beginning of the annealing up to the complete damage recover y, have been determined for the different Si doses for a given B doping lev el. Damage removal has been followed by double crystal x-ray diffraction. O ur results confirm that the formation of boron-interstitial silicon cluster s traps a relevant fraction of the interstitials produced by the implantati on. This trapping action gives rise to a strong reduction of the interstiti al supersaturation, prevents the interstitial clusters from being transform ed in {113} defects and modifies the time evolution of the transient enhanc ed diffusion. X-ray analyses indicate also that the size of the boron-inter stitial silicon clusters remains below 2 nm. (C) 2001 American Institute of Physics.