The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

Ito, N Moriya, T Uesugi, F Moriya, S Aomori, M Kato, Y

N. Ito et al., The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition, J VAC SCI A, 19(4), 2001, pp. 1248-1254

10

INGLESE

Article

Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS

0734-2101 → ACNP

19

4

2001

1

1248 - 1254

ISI

0734-2101(200107/08)19:4<1248:TAOISM>2.0.ZU;2-N

It has been successfully demonstrated that the scattered-light intensity of thermally grown particle clouds consisting of particles of less than 20 nm in size above wafers in a real tungsten (W) chemical vapor deposition (CVD ) chamber correlate well with both the surface roughness of the W-CVD film measured by atomic force microscopy and with the gas-flow ratio SiH4/WF6. I n addition. we can observe the appearance and motion of particle clouds cor responding to the transient variation of the ratio SiH4/WF6 at the conversi on of gases and at the change of the flow ratio. These features of our in s itu particle monitor enable us to achieve the mass-production conditions fo r particle-free and smooth surfaces of W films with short cycle time. Moreo ver, our particle monitor is sensitive enough to adopt in the development o f process conditions as the reduction of design rules for large-scale integ rated circuit proceeds. Therefore, applying our in situ particle monitor ab ove wafers for developing mass-production conditions is a notable method to minimize the monitor wafers and to realize short cycle time. (C) 2001 Amer ican Vacuum Society.