The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

Citation
N. Ito et al., The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition, J VAC SCI A, 19(4), 2001, pp. 1248-1254
Citations number
10
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
0734-2101 → ACNP
Volume
19
Issue
4
Year of publication
2001
Part
1
Pages
1248 - 1254
Database
ISI
SICI code
0734-2101(200107/08)19:4<1248:TAOISM>2.0.ZU;2-N
Abstract
It has been successfully demonstrated that the scattered-light intensity of thermally grown particle clouds consisting of particles of less than 20 nm in size above wafers in a real tungsten (W) chemical vapor deposition (CVD ) chamber correlate well with both the surface roughness of the W-CVD film measured by atomic force microscopy and with the gas-flow ratio SiH4/WF6. I n addition. we can observe the appearance and motion of particle clouds cor responding to the transient variation of the ratio SiH4/WF6 at the conversi on of gases and at the change of the flow ratio. These features of our in s itu particle monitor enable us to achieve the mass-production conditions fo r particle-free and smooth surfaces of W films with short cycle time. Moreo ver, our particle monitor is sensitive enough to adopt in the development o f process conditions as the reduction of design rules for large-scale integ rated circuit proceeds. Therefore, applying our in situ particle monitor ab ove wafers for developing mass-production conditions is a notable method to minimize the monitor wafers and to realize short cycle time. (C) 2001 Amer ican Vacuum Society.