A novel antistiction method using harmonic excitation on the microstructure

Authors
Citation
Wp. Lai et W. Fang, A novel antistiction method using harmonic excitation on the microstructure, J VAC SCI A, 19(4), 2001, pp. 1224-1228
Citations number
11
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
0734-2101 → ACNP
Volume
19
Issue
4
Year of publication
2001
Part
1
Pages
1224 - 1228
Database
ISI
SICI code
0734-2101(200107/08)19:4<1224:ANAMUH>2.0.ZU;2-S
Abstract
A novel antistiction method using harmonic excitation on the microstructure is presented. We exploit a simplified model consisting of a single-degree- of-freedom mass-damping-spring system to simulate the drying process of the microstructure. Based on this proposed method, we can predict the dynamic response of the microstructure including the resonant frequency and the dam ping characteristic of the drying system. And then adequate harmonic excita tion is applied to release the microstructure during drying process. Silico n dioxide beams with 0.7-/-mum-thick, 16-mum-wide, 120-mum-long, 4 mum gap. were released successfully by this method. Theoretical predictions of the dynamic behavior of microstructures during the drying process agree well wi th experimental results. The proposed approach effectively improves the yie ld rate of the microstructure without additional masks and complicated proc ess during the postetch release process. (C) 2001 American Vacuum Society.