Double textured cylindrical block copolymer domains via directional solidification on a topographically patterned substrate

Citation
C. Park et al., Double textured cylindrical block copolymer domains via directional solidification on a topographically patterned substrate, APPL PHYS L, 79(6), 2001, pp. 848-850
Citations number
20
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
0003-6951 → ACNP
Volume
79
Issue
6
Year of publication
2001
Pages
848 - 850
Database
ISI
SICI code
0003-6951(20010806)79:6<848:DTCBCD>2.0.ZU;2-2
Abstract
Directional solidification of cylinder forming block copolymer films confin ed between a directionally crystallizing solvent (benzoic acid) and a topog raphically patterned silicon substrate imparts a particular orientation to the block copolymer microdomains that is dependent of the solidification di rection and the local film thickness. The substrate features (30 nm high, 2 mum wide square mesas on a 4 mum sq lattice) shape the film morphology by periodically modulating the local film thickness. Thicker regions between s ubstrate features (plateaus) exhibit in-plane cylinders aligned in the crys tallization direction and thinner regions over the substrate features (mesa s) display vertically aligned cylindrical domains. This approach is a simpl e and general technique for engineering an intended domain orientation in s pecific areas of a block copolymer film. Development of this method for nan olithographic applications is demonstrated through oxygen plasma reactive i on etching of the patterned cylindrical domains. (C) 2001 American Institut e of Physics.