Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers

Citation
Nd. Telling et al., Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers, J APPL PHYS, 89(11), 2001, pp. 7074-7076
Citations number
9
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
0021-8979 → ACNP
Volume
89
Issue
11
Year of publication
2001
Part
2
Pages
7074 - 7076
Database
ISI
SICI code
0021-8979(20010601)89:11<7074:IIDIBD>2.0.ZU;2-U
Abstract
Interdiffusion and intermixing have been examined in Fe/Si trilayers prepar ed with ions of different energies, using the direct ion beam deposition te chnique. Isotope-pure layers were deposited and spin-polarized neutron refl ectivity used to determine the role of Fe diffusion in iron silicide format ion. It was found that a nonmagnetic iron silicide was formed that containe d Fe from both the top and bottom layers in the trilayer, suggesting comple te diffusion across the spacer region. Electron microscopy observations rev ealed the presence of an iron silicide phase and crystalline interface laye rs in films prepared with low energy ions (30 eV), while mixed and amorphou s-like regions were found at higher ion energies (100 eV). (C) 2001 America n Institute of Physics.