Preparation of thick functionally graded layers of ceramics by surface modification of tantalum and titanium using high temperature plasma processing

Citation
M. Nunogaki et al., Preparation of thick functionally graded layers of ceramics by surface modification of tantalum and titanium using high temperature plasma processing, MATER TRANS, 42(3), 2001, pp. 457-459
Citations number
3
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Material Science & Engineering
Journal title
MATERIALS TRANSACTIONS
ISSN journal
1345-9678 → ACNP
Volume
42
Issue
3
Year of publication
2001
Pages
457 - 459
Database
ISI
SICI code
1345-9678(200103)42:3<457:POTFGL>2.0.ZU;2-0
Abstract
Surfaces of metals, such as Ta acid Ti, have been changed successfully to a new type of ceramic layers having the compositional gradient by means of t he plasma processing at high temperature above 900 degreesC. Surfacer of Ta and Ti were transformed to thick layers of ceramics, i.e. TiC, TiN, TaC or TaN components, respectively, by carburizing or nitriding. Resultantly, a Vicker's hardness of each modified sample surface remarkably increased over 3000 kg/mm(2) The density of carbides or nitrides in the modified layer an d at the interface was measured to decrease with depth. The width of interf ace was wide about 7 mum, in the case of TiC. Additionally, the irradiation of 20 MeV-electron beam to samples as the pretreatment before the plasma p rocessing was effective to increase the thickness of modified layer.