Microstructure of Fe-N thin films prepared using an atomic nitrogen beam

Citation
Nd. Telling et al., Microstructure of Fe-N thin films prepared using an atomic nitrogen beam, J VAC SCI A, 19(2), 2001, pp. 405-409
Citations number
12
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
0734-2101 → ACNP
Volume
19
Issue
2
Year of publication
2001
Pages
405 - 409
Database
ISI
SICI code
0734-2101(200103/04)19:2<405:MOFTFP>2.0.ZU;2-5
Abstract
The formation of Fe-N thin films by exposure to an atomic (free radical) ni trogen beam is reported. This new method of preparing Fe-N films uses fluxe s of highly reactive, thermal energy N atoms that do not disturb the film m icrostructure. It is shown that by careful control of the exposure conditio ns, a range of predominantly single phase films can be obtained. At low nit rogen concentrations an amorphous-like phase is observed, whereas crystalli ne phases of epsilon -Fe2-3N and zeta -Fe2N are formed at higher concentrat ions. Dramatic differences in the microstructure and crystallographic textu re of these films reveal the inherent microstructure of the different phase s rather than the influence of the growth technique. (C) 2001 American Vacu um Society.