Application of ion beam techniques for preparation of metal ion-implanted TiO2 thin film photocatalyst available under visible light irradiation: Metal ion-implantation and ionized cluster beam method

Yamashita, H Harada, M Misaka, J Takeuchi, M Ichihashi, Y Goto, F Ishida, M Sasaki, T Anpo, M

H. Yamashita et al., Application of ion beam techniques for preparation of metal ion-implanted TiO2 thin film photocatalyst available under visible light irradiation: Metal ion-implantation and ionized cluster beam method, J SYNCHROTR, 8, 2001, pp. 569-571

11

INGLESE

Article

Apllied Physucs/Condensed Matter/Materiales Science

JOURNAL OF SYNCHROTRON RADIATION

0909-0495 → ACNP

8

2001

2

569 - 571

ISI

0909-0495(200103)8:<569:AOIBTF>2.0.ZU;2-T

Transparent TiO2 thin film photocatalysts have been prepared on silica glas s plate by an Ionized Cluster Beam (ICB) method. In order to improve the el ectronic properties of these photocatalysts, transition metal ions (V+, Cr, Mn+, Fe+) were implanted into the TiO2 thin films at high energy accelera tion using an advanced metal ion-implantation technique. The combination of these ion beam techniques can allow us to prepare the TiO2 thin film photo catalysts which can work effectively under visible light (lambda >450 nm) a nd/or solar light irradiation. The investigation using XAFS and ab initio m olecular calculation suggests that the substitution of octahedrally coordin ated Ti ions in TiO2 lattice with implanted metal ions is important to modi fy TiO2 to be able to adsorb visible light and operate under visible light irradiation.