Application of ion beam techniques for preparation of metal ion-implanted TiO2 thin film photocatalyst available under visible light irradiation: Metal ion-implantation and ionized cluster beam method

Citation
H. Yamashita et al., Application of ion beam techniques for preparation of metal ion-implanted TiO2 thin film photocatalyst available under visible light irradiation: Metal ion-implantation and ionized cluster beam method, J SYNCHROTR, 8, 2001, pp. 569-571
Citations number
11
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF SYNCHROTRON RADIATION
ISSN journal
0909-0495 → ACNP
Volume
8
Year of publication
2001
Part
2
Pages
569 - 571
Database
ISI
SICI code
0909-0495(200103)8:<569:AOIBTF>2.0.ZU;2-T
Abstract
Transparent TiO2 thin film photocatalysts have been prepared on silica glas s plate by an Ionized Cluster Beam (ICB) method. In order to improve the el ectronic properties of these photocatalysts, transition metal ions (V+, Cr, Mn+, Fe+) were implanted into the TiO2 thin films at high energy accelera tion using an advanced metal ion-implantation technique. The combination of these ion beam techniques can allow us to prepare the TiO2 thin film photo catalysts which can work effectively under visible light (lambda >450 nm) a nd/or solar light irradiation. The investigation using XAFS and ab initio m olecular calculation suggests that the substitution of octahedrally coordin ated Ti ions in TiO2 lattice with implanted metal ions is important to modi fy TiO2 to be able to adsorb visible light and operate under visible light irradiation.