Localized electrodeposition using a scanning tunneling microscope tip as ananoelectrode

Citation
W. Schindler et al., Localized electrodeposition using a scanning tunneling microscope tip as ananoelectrode, J ELCHEM SO, 148(2), 2001, pp. C124-C130
Citations number
37
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
0013-4651 → ACNP
Volume
148
Issue
2
Year of publication
2001
Pages
C124 - C130
Database
ISI
SICI code
0013-4651(200102)148:2<C124:LEUAST>2.0.ZU;2-H
Abstract
The mechanism of localized electrodeposition on the nanometer scale is stud ied using the tip of an electrochemical scanning tunneling microscope as a "nanoelectrode," which is retracted from the substrate (working electrode) during growth of the clusters. The system chosen exemplarily is Au(111)/Co2 +, which shows a relatively weak substrate/deposit interaction compared to the strong interaction characteristic of underpotential deposition systems. The width and height of the clusters, which can be grown with diameters ev en below 10 nm, are determined by the diameter of the tip apex, the distanc e between tip and substrate, the substrate potential, and by the amount of Co transferred to the substrate via the tip. The influence of these paramet ers on the cluster growth can be well understood assuming diffusion as the mechanism of Co transfer from the rip to the substrate. Field and charging effects of either tip or substrate can be excluded due to the large distanc e of approximately 20 nm between both electrodes. (C) 2001 The Electrochemi cal Society. All rights reserved.