Enhanced coercivity by substrate bias configuration in Co-based alloy thinfilm

Citation
D. Jin et al., Enhanced coercivity by substrate bias configuration in Co-based alloy thinfilm, J VAC SCI A, 19(1), 2001, pp. 379-382
Citations number
13
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
0734-2101 → ACNP
Volume
19
Issue
1
Year of publication
2001
Pages
379 - 382
Database
ISI
SICI code
0734-2101(200101/02)19:1<379:ECBSBC>2.0.ZU;2-A
Abstract
Using the substrate bias configuration in a single sputtering process, Go-b ased alloy triple-layer magnetic thin films were deposited. A coercivity in crease was obtained in both room-temperature-deposited and high-temperature -deposited (300 degreesC) films, and the coercivity was optimized in a NB-B -NB (NB: no bias and B: bias applied in sputtering) type of bias configurat ion. Dislocation and voids introduced by bias sputtering and the diffusion at the grain boundary and interfaces were proposed to explain the improveme nt of coercivity. The bias-configured sputtering triple-magnetic-layer stru cture was suggested as a new approach to improve the magnetic properties, w hich maintain the advantage of multi-magnetic-layer media. (C) 2001 America n Vacuum Society.