A study on oxide film growth on Nd surface using XPS

Authors
Li, Y Chen, LY Zhang, Z Wu, YG Qiao, Y Xu, WX
Citation
Y. Li et al., A study on oxide film growth on Nd surface using XPS, ACT PHY C E, 50(1), 2001, pp. 79-82
Citations number
3
Language
CHINESE
art.tipo
Article
Categorie Soggetti
Physics
Journal title
ACTA PHYSICA SINICA
ISSN journal
1000-3290 → ACNP
Volume
50
Issue
1
Year of publication
2001
Pages
79 - 82
Database
ISI
SICI code
1000-3290(200101)50:1<79:ASOOFG>2.0.ZU;2-2
Abstract
X-ray photoelectron spectroscopy(XPS) has been used to follow oxide film gr owth on pure Nd surface over a wide range of exposure to oxygen and air. Ox ide film was noticed to consist of oxide, hydroxide and chemically absorbed water, all of which exhibited logarithmic-type growth kinetics. The oxide and chemically absorbed water stop growing after a certain exposure, wherea s the hydroxide,which plays a significant role ultimately, shows continued and persistent growth.