Micropatterning on methylsilsesquioxane-phenylsilsesquioxane thick films by the sol-gel method

Citation
A. Matsuda et al., Micropatterning on methylsilsesquioxane-phenylsilsesquioxane thick films by the sol-gel method, J AM CERAM, 83(12), 2000, pp. 3211-3213
Citations number
9
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
ISSN journal
0002-7820 → ACNP
Volume
83
Issue
12
Year of publication
2000
Pages
3211 - 3213
Database
ISI
SICI code
0002-7820(200012)83:12<3211:MOMTFB>2.0.ZU;2-9
Abstract
Prismatic patterns with a pitch of 30 pm and a slant height of 30 mum were embossed successfully in 70:30 (in mol %) methylsilsesequioxine:phenylsilse sqeioxene (MeSiO3/2-PhSiO3/2) thick films on glass substrates by laminating an organic polymer sheet as a stamper with the patterns against the films. The embossed shape of the prismatic patterns precisely agreed with the neg ative shape of those of the stamper that was used. The resultant MeSiO3/2-P hSiO3/2 films were transparent, and the refractive index of the films was a djusted to 1.51, to match that of the glass substrate.