SPUTTERING EXPERIMENTS ON B4C DOPED CFC UNDER HIGH PARTICLE-FLUX WITHLOW-ENERGY

Authors
NAKAMURA K DAIRAKU M AKIBA M OKUMURA Y
Citation
K. Nakamura et al., SPUTTERING EXPERIMENTS ON B4C DOPED CFC UNDER HIGH PARTICLE-FLUX WITHLOW-ENERGY, Journal of nuclear materials, 241, 1997, pp. 1142-1146
Citations number
9
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
Journal title
Journal of nuclear materials → ACNP
ISSN journal
0022-3115
Volume
241
Year of publication
1997
Pages
1142 - 1146
Database
ISI
SICI code
0022-3115(1997)241:<1142:SEOBDC>2.0.ZU;2-2
Abstract
Sputtering property of newly developed 5-10% B4C doped CFCs with high thermal conductivity, similar to 160 W/m/K, was investigated under hig h particle flux with low energy by using the super low energy ion sour ce (SLEIS) facility at Japan Atomic Energy Research Institute (JAERI). Hydrogen beam irradiation Lv:is performed with particle flux of 2-3 x 10(20)/m(2)/s and particle fluence of 3-9 x 10(24)/m(2) at 50 eV. Red uction of erosion of the matrix of CFCs by B4C doping was observed wit h a scanning electron microscope, while the carbon fibers were prefere ntially eroded. The sputtering yield of the B4C doped CFCs was 0.025-0 .034.