Study of oxygen/tetraethoxysilane plasmas in a helicon reactor using optical emission spectroscopy and mass spectrometry

Citation
K. Aumaille et al., Study of oxygen/tetraethoxysilane plasmas in a helicon reactor using optical emission spectroscopy and mass spectrometry, PLASMA SOUR, 9(3), 2000, pp. 331-339
Citations number
24
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physics
Journal title
PLASMA SOURCES SCIENCE & TECHNOLOGY
ISSN journal
0963-0252 → ACNP
Volume
9
Issue
3
Year of publication
2000
Pages
331 - 339
Database
ISI
SICI code
0963-0252(200008)9:3<331:SOOPIA>2.0.ZU;2-U
Abstract
Oxygen/tetraethoxysilane (O-2/TEOS) plasmas created in a low-pressure (2 mT orr) rf helicon reactor have been studied by optical emission spectroscopy and mass spectrometry as a function of the rf (13.56 MHz) power injected in to the plasma, which is varied from 25 to 300 W. Complementary measurements for the interpretation of the mass spectrometric data have also been carri ed out using the threshold ionization mass spectrometry technique. It is sh own that valuable information on the parent molecules is obtained by both o ptical emission spectroscopy and threshold ionization mass spectrometry tec hniques. At low rf power TEOS molecules and organic compounds like hydrocar bons (CH4, C2H2) and alcohols (CH3CH2OH) as well as H-2, H2O, CO, O-2, CO2 are observed. At high rf power TEOS and O-2 molecules are totally or mostly depleted, the share of hydrocarbons decreases and carbon monoxide, carbon dioxide, water and hydrogen become the essential parts of the gas phase.