Structure characteristic of buried SiC layers

Citation
H. Yan et al., Structure characteristic of buried SiC layers, THIN SOL FI, 368(2), 2000, pp. 241-243
Citations number
8
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
0040-6090 → ACNP
Volume
368
Issue
2
Year of publication
2000
Pages
241 - 243
Database
ISI
SICI code
0040-6090(20000615)368:2<241:SCOBSL>2.0.ZU;2-L
Abstract
In this work, we have prepared the buried SiC layers by a metal vapor vacuu m are (MEVVA) ion source, respectively, on Si(100) and surface oxidized Si( 100) wafers. The Fourier transform infrared spectroscopy (FTIR) spectra of the buried layers were found to be composed of two components, one assigned to amorphous SiC (a-SiC) and the other one to cubic SiC (beta-SiC). It was found that there is a critical dose at which the relative amount of beta-S iC increase abruptly, and the silicon oxide thickness dependence of the fra ction ratio (the relative amount of beta-SiC/the relative amount of a-SiC) in the buried layers is of the shape similar to the distribution of the car bon content. The results indicate that in the region of the maximum carbon content the crystallized degree of the buried layers is higher. (C) 2000 El sevier Science S.A. All rights reserved.