In this paper, we report the study of the magnetic properties of (Li0.
5-x/2Mn0.1ZnxFe2.35-x/2O4) films with x = 0, 0.16, 0.32, 0.48. The alm
s were deposited on fused quartz substrates by rf sputtering technique
under various deposition conditions. The magnetic properties of the f
ilms annealed at 750 degrees C are being reported. The M. values of th
e films deposited at a rf power of 240 W in argon atmosphere were foun
d to be smaller than tile corresponding bulk values. The M. value was
found to be maximum at x = 0.32, similar to the bulk. The H-c values o
f the films are much higher than the bulk values and decrease as a fun
ction of x.