Excimer laser irradiation of SrRuO3 epitaxial thin films

Citation
F. Benitez et al., Excimer laser irradiation of SrRuO3 epitaxial thin films, APPL SURF S, 154, 2000, pp. 622-626
Citations number
13
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
0169-4332 → ACNP
Volume
154
Year of publication
2000
Pages
622 - 626
Database
ISI
SICI code
0169-4332(200002)154:<622:ELIOSE>2.0.ZU;2-I
Abstract
Single and multishot excimer laser ablation of SrRuO3 (SRO) epitaxial thin films has been studied, aiming at selective removal of SRO electrodes in de vice applications. High quality SRO epitaxial thin films were grown by puls ed laser deposition on LaALO(3) (001) substrates; subsequent irradiation wa s performed by an excimer laser at 248 nm wavelength. Inspection of the abl ated surfaces by scanning electron microscopy shows the existence of two we ll-defined regimes above damage threshold depending on the laser fluence, n amely exfoliational and hydrodynamical, which closely correspond to the dif ferent mechanisms responsible for material emission. The role of spot size and film thickness with regard to improved edge definition and damage-free substrates has been studied. (C) 2000 Elsevier Science B.V. All rights rese rved.