Quantum mechanical simulations of carrier transport in Si require an accura
te model of the complicated Si bandstructure. Tight-binding models are an a
ttractive method of choice since they bear the full electronic structure sy
mmetry within If hem and can discretize a realistic device on an atomic sca
le. However, tight-binding models are not simple to pa rameterize and chara
cterize. This work addresses two issues: (1) the need for an automated fitt
ing:procedure that maps tight-binding orbital interaction-energies to physi
cal observables such as effective masses and band edges, and (2) the capabi
lities and accuracy of the nearest and second-nearest neighbor tight-bindin
g sp3s* models with respect to carrier transport in indirect bandgap materi
als. A genetic algorithm approach is used to fit orbital interaction energi
es of these tight-binding models in a nine-; and 20-dimensional global opti
mization problem for Si. A second-nearest neighbor sp3s* parameter set that
fits all relevant conduction and valence band properties: with a high degr
ee of accuracy is presented. No such global fit was found for the nearest n
eighbor sp3s* model and two sets, one heavily weighed for electron properti
es and the other for hole properties, are presented. Bandstructure properti
es relevant for electron and hole transport in Si derived from these three
sets are compared with the seminal Vogl et al. [Journal of the Physics and
Chemistry of Solids 44, 365 (1983)] parameters. (C) 2000 Academic Press.