Resolution limiting mechanism in electron beam lithography

Citation
M. Yoshizawa et S. Moriya, Resolution limiting mechanism in electron beam lithography, ELECTR LETT, 36(1), 2000, pp. 90-91
Citations number
2
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
ELECTRONICS LETTERS
ISSN journal
0013-5194 → ACNP
Volume
36
Issue
1
Year of publication
2000
Pages
90 - 91
Database
ISI
SICI code
0013-5194(20000106)36:1<90:RLMIEB>2.0.ZU;2-A
Abstract
The actual mechanism limiting resolution in electron. beam lithography is s tudied experimentally. A higher resolution can be obtained through a smooth er pattern edge, which is derived from a steeper beam profile slope at the threshold level. Reducing the beam blur improves the resolution limit becau se it increases the slope and smooths the pattern edge.