Role of adsorbed oxygen on ruthenium surfaces in the underpotential deposition of copper

Citation
Ma. Quiroz et Y. Meas, Role of adsorbed oxygen on ruthenium surfaces in the underpotential deposition of copper, LATIN AM A, 30(1), 2000, pp. 61-67
Citations number
33
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Chemical Engineering
Journal title
LATIN AMERICAN APPLIED RESEARCH
ISSN journal
0327-0793 → ACNP
Volume
30
Issue
1
Year of publication
2000
Pages
61 - 67
Database
ISI
SICI code
0327-0793(200001)30:1<61:ROAOOR>2.0.ZU;2-N
Abstract
The underpotential deposition of copper (Cu UPD) on polycrystalline rutheni um surfaces in presence of adsorbed oxygen was studied in 0.5 M H2SO4 solut ions as supporting electrolyte. The voltamperometric characteristics of the Cu UPD process were analyzed at two different oxygen coverage degrees in o rder to establish the influence of adsorbed oxygen on this process. From th e experimental results, it was possible to establish that the electronic ch aracteristics of the underpotentially deposited Ru surface and Cu adlayer w ere modified markedly by the presence of adsorbed oxygen. Since the electro sorption valency of Cu on Ru (1.8 less than or equal to gamma(Cu) less than or equal to 2.2) confirms the metallic nature of Cu adatoms, the observed effects were interpreted in terms of electron density changes in metallic R u sites due to the formation of neighboring Ru-O surface bonds.