Influence of film characteristics on the sputtering rate of MgO

Citation
S. Hidaka et al., Influence of film characteristics on the sputtering rate of MgO, IEICE TR EL, E82C(10), 1999, pp. 1804-1807
Citations number
3
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEICE TRANSACTIONS ON ELECTRONICS
ISSN journal
0916-8524 → ACNP
Volume
E82C
Issue
10
Year of publication
1999
Pages
1804 - 1807
Database
ISI
SICI code
0916-8524(199910)E82C:10<1804:IOFCOT>2.0.ZU;2-L
Abstract
We investigated the relationship between the film characteristics and the s puttering rate of the MgO protecting layer in AC-PDP. As possible elements for determining the sputtering rate, we considered the density, orientation , and surface morphology. With respect to the orientation, we found that th e sputtering rate increased for the sequence of (200) < (220) < (111). Howe ver, we noticed that orientation and surface structure are not really decis ive factors affecting the sputtering rate; the density of the film is most important.