Nano-lithography with atoms

Citation
As. Bell et al., Nano-lithography with atoms, SURF SCI, 435, 1999, pp. 40-47
Citations number
24
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
0039-6028 → ACNP
Volume
435
Year of publication
1999
Pages
40 - 47
Database
ISI
SICI code
0039-6028(19990802)435:<40:NWA>2.0.ZU;2-#
Abstract
The general features of atom lithography, such as parallel deposition, larg e exposure area, nanometer resolution and both direct writing and resist ba sed patterning, make it a promising field. A summary of the present state o f neutral atom lithography is presented. The methods and results from vario us groups ale discussed. A more in-depth study of three different types of atom lithography undertaken in our group is given. (C) 1999 Elsevier Scienc e B.V. All rights reserved.