The general features of atom lithography, such as parallel deposition, larg
e exposure area, nanometer resolution and both direct writing and resist ba
sed patterning, make it a promising field. A summary of the present state o
f neutral atom lithography is presented. The methods and results from vario
us groups ale discussed. A more in-depth study of three different types of
atom lithography undertaken in our group is given. (C) 1999 Elsevier Scienc
e B.V. All rights reserved.