Structure of vacuum-deposited permethyldecasilane thin films

Citation
Y. Ichino et al., Structure of vacuum-deposited permethyldecasilane thin films, SYNTH METAL, 101(1-3), 1999, pp. 637-638
Citations number
4
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SYNTHETIC METALS
ISSN journal
0379-6779 → ACNP
Volume
101
Issue
1-3
Year of publication
1999
Pages
637 - 638
Database
ISI
SICI code
0379-6779(199905)101:1-3<637:SOVPTF>2.0.ZU;2-M
Abstract
A linear oligosilane, permethyldecasilane was synthesized and vapor-deposit ed onto quartz substrates at room-temperature or -150 degrees C with variou s film thickness. X-ray diffraction measurements exhibited a highly ordered layer structure in the films deposited at room-temperature, while such an ordered structure could hardly be observed in those deposited onto cooled s ubstrates. Deduced spacing of the layer was found to be smaller than the le ngth of the oligosilane molecule along the main chain in all-trans conforma tion, suggesting that the molecules are not oriented normal to the substrat es but with a certain tilt angle. The tilting structure is also supported b y the dependence of the polarized absorption spectra on the incident angle.