Communication: A low-temperature preparation of crystalline Si3N4 is descri
bed that avoids the temperatures above 1200 degrees C necessary in other me
thods. Si(3)N(4)s chemical stability, high-temperature strength, and excell
ent creep resistance make it a promising Fe material for high-temperature e
ngineering applications. The Figure shows a transmission electron microscop
y image of a Si3N4 sample.