A modified unbalanced magnetron sputtering technique was applied to the gro
wth of multilayer Co/Cu films in order to systematically study the interfac
e structure evolved under ion bombardment. X-ray reflectivity measurements
revealed an interface smoothing effect in samples deposited under similar t
o 200 eV ion bombardment. A reduction in the Bragg peak intensity for sampl
es with a greater number of bilayer repeats was also observed. This was att
ributed to roughening of the final surface in the thicker films. (C) 1999 E
lsevier Science B.V. All rights reserved.