Pulsed metal ion source by triggerless shunting arc discharge

Citation
K. Yukimura et al., Pulsed metal ion source by triggerless shunting arc discharge, J VAC SCI B, 17(2), 1999, pp. 871-874
Citations number
3
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
1071-1023 → ACNP
Volume
17
Issue
2
Year of publication
1999
Pages
871 - 874
Database
ISI
SICI code
1071-1023(199903/04)17:2<871:PMISBT>2.0.ZU;2-5
Abstract
The shunting are is an are discharge that is self-ignited in a low pressure gas without any tri source. Possible application of the shunting are to a pulsed ion source for plasma based ion implantation will be discussed. A 35 mm long titanium (Ti) wire 0.05 mm in diameter is heated by means of pulse d current from a 20 mu F capacitor (1.5-3.0 kV) in an argon environment wit h pressure from 2.7 to 1300 Pa. Are ignition was indicated by an abrupt dec rease of the wire voltage accompanied by an abrupt increase of the are curr ent. Ultraviolet light spectroscopy has shown that a plasma containing Ti i ons and neutrals is produced by means of the are discharge. The maximum are current is about 2.1 kA with are voltage of 200-300 V. The wire temperatur e is estimated at about 1500 K, well below the melting point of Ti. The wir e therefore remains in a solid phase during the are discharge so that the w ire can be used repeatedly. Ions are extracted from the plasma by a 5 kV, 1 0 mu s negative high voltage pulse applied to a target. Shunting are igniti on using materials other than Ti will also be discussed. (C) 1999 American Vacuum Society. [S0734-211X(99)03002-4].