NITRIDATION OF VACUUM-EVAPORATED MOLYBDENUM FILMS IN H-2 N-2 MIXTURES/

Citation
T. Amazawa et H. Oikawa, NITRIDATION OF VACUUM-EVAPORATED MOLYBDENUM FILMS IN H-2 N-2 MIXTURES/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2510-2516
Citations number
10
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
0734-2101
Volume
16
Issue
4
Year of publication
1998
Pages
2510 - 2516
Database
ISI
SICI code
0734-2101(1998)16:4<2510:NOVMFI>2.0.ZU;2-F
Abstract
The nitridation behavior of molybdenum (Mo) films has been studied in relation to the crystal structure of the films. Vacuum evaporated Mo f ilms are nitrided to form gamma-Mo2N by annealing in H-2/N-2 mixtures in the temperature region of 400-900 degrees C. The temperature region becomes narrow with increasing H-2/N-2 flow ratio, and the Mo films a re not nitrided by annealing in only nitrogen. These results are inter preted as caused by the reaction process involving hydrogen reduction of molybdenum oxide followed by direct nitridation of Mo. During annea ling, the Mo films show uniform nitrogen distribution throughout the f ilm and the nitrogen content increases with increasing annealing time. This behavior is well explained by the grain-boundary nitridation mod el in which each columnar grain of a Mo film is nitrided from the peri phery to the center of the grain. (C) 1998 American Vacuum Society. [S 0734-2101(98)06704-9].