EFFECTS OF REACTION-PRODUCT DURING HYDROGENATION OF SI SURFACES IN HFSOLUTION

Citation
Y. Sugita et S. Watanabe, EFFECTS OF REACTION-PRODUCT DURING HYDROGENATION OF SI SURFACES IN HFSOLUTION, JPN J A P 1, 37(3B), 1998, pp. 1193-1197
Citations number
25
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physics, Applied
Volume
37
Issue
3B
Year of publication
1998
Pages
1193 - 1197
Database
ISI
SICI code
0021-4922(1998)37:3B<1193:EORDHO>2.0.ZU;2-B
Abstract
The reaction between the H-terminated Si surfaces and H2SiF6 solution, which is a reaction product of the dissolving SiO2 in the HF solution , was examined. The H2SiF6 solution selectively oxidized the mono-hydr ide on Si and degraded the hydrophobicity of the surface, while the di -hydride on Si remained stable in the solution. These results explaine d the crystal orientation dependence of the oxide removal from the Si surface.