REDUCTION OF GASEOUS CONTAMINATION BY UV PHOTOELECTRON METHOD/

Citation
H. Tobimatsu et al., REDUCTION OF GASEOUS CONTAMINATION BY UV PHOTOELECTRON METHOD/, IEEE transactions on semiconductor manufacturing, 11(1), 1998, pp. 9-12
Citations number
9
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Engineering, Eletrical & Electronic","Engineering, Manufacturing","Physics, Applied
ISSN journal
0894-6507
Volume
11
Issue
1
Year of publication
1998
Pages
9 - 12
Database
ISI
SICI code
0894-6507(1998)11:1<9:ROGCBU>2.0.ZU;2-X
Abstract
We have previously reported that UV/photoelectron method, in which par ticles are charged by photoelectrons emitted from the UV irradiated me tal surface and collected to the electrodes by the electric field, is effective to collect particles in the gas phase, This paper represents that the UV/photoelectron method is effective not only to collect par ticles but also to reduce the gaseous contamination such as hydrocarbo n or organic compounds and water molecules, By using the UV/photoelect ron method the carbon atom concentration on the Si surface is reduced to 1/4 compared with that stored in the clean room for the storage per iod of about 40 h, The oxygen concentration is reduced to 1/7 in the s ame condition.