GENERATION OF SUBQUARTER-MICRON RESIST STRUCTURES USING OPTICAL INTERFERENCE LITHOGRAPHY AND IMAGE REVERSAL

Citation
Jy. Decker et al., GENERATION OF SUBQUARTER-MICRON RESIST STRUCTURES USING OPTICAL INTERFERENCE LITHOGRAPHY AND IMAGE REVERSAL, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 1949-1953
Citations number
23
Language
INGLESE
art.tipo
Article
ISSN journal
1071-1023
Volume
15
Issue
6
Year of publication
1997
Pages
1949 - 1953
Database
ISI
SICI code
1071-1023(1997)15:6<1949:GOSRSU>2.0.ZU;2-5
Abstract
We show that by using interference lithography coupled with image reve rsal techniques we can generate resist structures ranging from one-dim ensional gratings to two-dimensional arrays of posts and holes. These resist structures have high aspect ratios and nearly vertical sidewall s. The structure dimensions are accurately controlled by varying the e xposure dose. These structures play critical roles in the generation o f subwavelength structured surfaces for optical applications. (C) 1997 American Vacuum Society.