Jy. Decker et al., GENERATION OF SUBQUARTER-MICRON RESIST STRUCTURES USING OPTICAL INTERFERENCE LITHOGRAPHY AND IMAGE REVERSAL, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 1949-1953
We show that by using interference lithography coupled with image reve
rsal techniques we can generate resist structures ranging from one-dim
ensional gratings to two-dimensional arrays of posts and holes. These
resist structures have high aspect ratios and nearly vertical sidewall
s. The structure dimensions are accurately controlled by varying the e
xposure dose. These structures play critical roles in the generation o
f subwavelength structured surfaces for optical applications. (C) 1997
American Vacuum Society.