Lowering of work function induced by deposition of ultra-thin rubidium fluoride layer on polycrystalline diamond surface

Citation
Kw. Wong et al., Lowering of work function induced by deposition of ultra-thin rubidium fluoride layer on polycrystalline diamond surface, APPL SURF S, 140(1-2), 1999, pp. 144-149
Citations number
15
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
0169-4332 → ACNP
Volume
140
Issue
1-2
Year of publication
1999
Pages
144 - 149
Database
ISI
SICI code
0169-4332(199902)140:1-2<144:LOWFIB>2.0.ZU;2-C
Abstract
Ultra-thin rubidium fluoride (RbF) was thermally evaporated onto polycrysta lline diamond surface. The role of RbF as a strong dipole layer to lower th e surface work function was investigated using ultraviolet photoemission sp ectroscopy, Kelvin probe and Auger electron spectroscopy. It was found that deposition of sub-monolayer of RbF could greatly reduce the work function of the diamond surface. Also, the ultra-thin RbF overlayer is very sensitiv e to electron irradiation. The electron irradiation can seriously weaken th e effect of RbF as a surface dipole. (C) 1999 Elsevier Science B.V. All rig hts reserved.