Observation of the trajectories of particles in process equipment by an insitu monitoring system using a laser light scattering method

Citation
N. Ito et al., Observation of the trajectories of particles in process equipment by an insitu monitoring system using a laser light scattering method, J VAC SCI B, 16(6), 1998, pp. 3339-3343
Citations number
12
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
1071-1023 → ACNP
Volume
16
Issue
6
Year of publication
1998
Pages
3339 - 3343
Database
ISI
SICI code
1071-1023(199811/12)16:6<3339:OOTTOP>2.0.ZU;2-0
Abstract
An in situ scattered laser light measurement system, which can detect indiv idual particles and observe their trajectories, has been produced experimen tally and has been used with tungsten (W) etchback reactive ion etching (RI E) equipment. The particles which are smaller than 100 nm in size can be de tected during plasma emission if the stray light that is caused by the lase r light is properly suppressed. The trajectories of the particles are succe ssfully observed in the W etchback RTE chamber by using this system under m ass production conditions. Not only the appearance of the particle but also the direction of particle trajectory correlate distinctly with the specifi c operating state of the equipment. When the rf power was turned off, many of the particles that were observed seemed to be drawn towards the wafer. O n the other hand, during injection of the N-2 purge gas to the process cham ber, the few particles that were frequently observed seemed to fall down, a way from the wafer. (C) 1998 American Vacuum Society. [S0734-211X(98)16406- 5].