PLASMA DIAGNOSTICS OF A DIRECT-CURRENT ARCJET DIAMOND REACTOR .1. ELECTROSTATIC-PROBE ANALYSIS

Citation
Sw. Reeve et Wa. Weimer, PLASMA DIAGNOSTICS OF A DIRECT-CURRENT ARCJET DIAMOND REACTOR .1. ELECTROSTATIC-PROBE ANALYSIS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3131-3136
Citations number
42
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
0734-2101
Volume
12
Issue
6
Year of publication
1994
Pages
3131 - 3136
Database
ISI
SICI code
0734-2101(1994)12:6<3131:PDOADA>2.0.ZU;2-8
Abstract
Plasma parameters were determined for a direct current arcjet diamond chemical vapor deposition reactor. Electron temperatures and densities were measured using a floating double probe technique, yielding value s ranging from 2.3 eV and 7x10(11) cm(-3) near the plasma gun nozzle t o 0.4 eV and 1x10(9) cm(-3) in the downstream and peripheral regions o f the plasma. These results show that the plasma is weakly ionized, in dicating that reactions involving electrons playa minor role in the ma croscopic gas-phase chemistry though high energy products from these r eactions may significantly affect film quality.