PREPARATION OF HIGHLY ORIENTED THIN-FILM OF NONLINEAR-OPTICAL MATERIAL BY VACUUM DEPOSITION

Citation
A. Inoue et al., PREPARATION OF HIGHLY ORIENTED THIN-FILM OF NONLINEAR-OPTICAL MATERIAL BY VACUUM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3068-3073
Citations number
10
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
0734-2101
Volume
12
Issue
6
Year of publication
1994
Pages
3068 - 3073
Database
ISI
SICI code
0734-2101(1994)12:6<3068:POHOTO>2.0.ZU;2-F
Abstract
Highly (001)-oriented thin films of 4-(N,N-dimethylamino)-3-acetamidon itrobenzene were prepared on a thermally oxidized silicon substrate us ing vapor deposition. The degree of (001) orientation depends consider ably on the substrate temperature (T-s) and deposition rate (R), which determines the kinetic energy (E(k)) of the molecules in a flux. Unde r the optimized experimental parameters of T-s=30 degrees C and R=600 nm/min, we fabricated the (001)-oriented thin film showing the full wi dth at half-maximum of x-ray rocking curve of 1.6 degrees. Surface fla tness was also improved as the deposition rate increased. It became cl ear that kinetic energy (E(k)) of the molecules in an evaporating flux strongly promoted (001) preferred orientation as could be seen by obs erving the surface morphology and a cross-sectional view of the sample s at their initial stage of growth.