UNIQUE HYDRIDE CHEMISTRY ON SILICON-PH3 INTERACTION WITH SI(100)-(2X1)

Citation
Ml. Colaianni et al., UNIQUE HYDRIDE CHEMISTRY ON SILICON-PH3 INTERACTION WITH SI(100)-(2X1), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 2995-2998
Citations number
24
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
0734-2101
Volume
12
Issue
6
Year of publication
1994
Pages
2995 - 2998
Database
ISI
SICI code
0734-2101(1994)12:6<2995:UHCOSI>2.0.ZU;2-6
Abstract
The dissociative adsorption of phosphine (PH3) on Si(100)-(2X1) and it s high temperature thermal behavior have been studied by high-resoluti on electron energy loss spectroscopy (HREELS), Auger electron spectros copy, and by temperature programmed desorption (TPD). Phosphine adsorb s dissociatively onto Si(100)-(2X1) at 100 K as PH2 and H species, as revealed by vibrational bands at 1050 cm(-1) [delta(SC)(PH2)] and 2100 cm(-1) [nu(Si-H)]. The PH2(a) undergoes thermal decomposition to adso rbed P and H near 650 K, as determined by HREELS. TPD measurements rev eal two PH3 desorption processes at 485 and 635 K. The 635 K desorptio n is shown to result from PH2+H recombination, while the mechanism for the 485 K desorption cannot be definitely identified. Additionally, t wo H-2 desorption states were observed at 685 and 770 K.