STRUCTURE MODELING OF DLC-FILMS FORMED BY PULSED-ARC METHOD

Citation
Ei. Tochitsky et Av. Stanishevsky, STRUCTURE MODELING OF DLC-FILMS FORMED BY PULSED-ARC METHOD, Ceramics international, 21(6), 1995, pp. 399-401
Citations number
10
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Material Science, Ceramics
Journal title
ISSN journal
0272-8842
Volume
21
Issue
6
Year of publication
1995
Pages
399 - 401
Database
ISI
SICI code
0272-8842(1995)21:6<399:SMODFB>2.0.ZU;2-O
Abstract
Reported here is the continuation of the structure characterization of carbon thin films produced by a pulsed vacuum are plasma source. Hydr ogen free carbon films with thickness up to 3 mu m were prepared with average deposition rate of 5 mu m/h onto various substrates. It was fo und that these carbon films are not quite amorphous and can be describ ed by modelling the clustered structure with different sp(3)/sp(2)/sp bond ratios depending on deposition conditions. Results of the experim ental investigations and numerical modelling of the films structure ar e presented.