INVESTIGATION OF ELECTRON SOURCE AND ION FLUX UNIFORMITY IN HIGH PLASMA-DENSITY INDUCTIVELY-COUPLED ETCHING TOOLS USING 2-DIMENSIONAL MODELING

Citation
Plg. Ventzek et al., INVESTIGATION OF ELECTRON SOURCE AND ION FLUX UNIFORMITY IN HIGH PLASMA-DENSITY INDUCTIVELY-COUPLED ETCHING TOOLS USING 2-DIMENSIONAL MODELING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3118-3137
Citations number
57
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physics, Applied
ISSN journal
1071-1023
Volume
12
Issue
6
Year of publication
1994
Pages
3118 - 3137
Database
ISI
SICI code
1071-1023(1994)12:6<3118:IOESAI>2.0.ZU;2-I