CHARACTERIZATION OF CARBON NITRIDE PRODUCED BY HIGH-CURRENT VACUUM-ARC DEPOSITION

Citation
J. Hartmann et al., CHARACTERIZATION OF CARBON NITRIDE PRODUCED BY HIGH-CURRENT VACUUM-ARC DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(6), 1997, pp. 2983-2987
Citations number
19
Language
INGLESE
art.tipo
Article
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
0734-2101
Volume
15
Issue
6
Year of publication
1997
Pages
2983 - 2987
Database
ISI
SICI code
0734-2101(1997)15:6<2983:COCNPB>2.0.ZU;2-N
Abstract
Carbon nitride thin films were deposited using the high-current are (H CA) evaporation technique varying the pressure in the chamber and the position of the samples with respect to the evaporation source. At dir ect deposition the nitrogen content in the films measured by elastic r ecoil detection analysis saturates at an atomic ratio of 0.18 due to c hemical sputtering. At positions when the substrates are shaded from t he carbon plasma by the sample holder the nitrogen content increases u p to 48 at. %. This observation can be explained by a decreased energy of the carbon ions, a higher arrival ratio of nitrogen to carbon ions and the high degree of ionization using the HCA technique. Varying th e sample position the binding character of nitrogen to carbon atoms in the films changes from sp(3) to sp(2). When the energy of the deposit ed particles is reduced graphitic clusters are formed in an amorphous matrix. (C) 1997 American Vacuum Society. [S0734-2101(97)02506-2].